About the MOCVD
Summary of MOCVD MOCVD(Metal Organic Chemical Vapor Deposition) technology, also known as OMVPE, MOVPE, etc., is a new technology proposed by rockwell corporation in 1968 for the preparation of compound semiconductor single thin films. MOCVD technique is to dilute the metal organic compounds in the carrier gas and Ⅴ ethnic or Ⅵ hydride in the heated elements of substrate and decomposition reaction, the products of the reaction, reaction to the epitaxial substrate to form a technology of epitaxial film, this [...]