Tungsten silicide

Appearance: black grey powder.
Purity: 99%
Purpose: WSi2 is used in microelectronics as electric shock material, shunt on polysilicon wire, anti-oxidation coating and resistance wire.
Grain size: 325 mesh
Chemical composition:
W: 76.1%
C: 0.01
P: 0.02
Fe: 0.20
S: 0.004
Si: remain
Tungstate is insoluble in water and water, soluble in nitric acid and hydrofluoric acid mixture.
Preparation method of tungsten silicide:
(1) Tungsten powder and silicon powder are mixed in a molar ratio of 1:2, and the titanium powder and the graphite powder are mixed and mixed in a molar ratio of 1:1.
(2) The W-Si mixed powder is placed in the center of the crucible. The Ti-C mixed powder is uniformly placed between the W-Si mixed powder and the crucible. Finally, a layer of Ti-C mixed powder is placed on top of all the mixed powders. The weight ratio of Ti-C mixed powder to W-Si mixed powder is (0.8~1.2):1
(3) The crucible containing the mixed powder is placed in a closed reactor, evacuated and filled with argon, and then the mixture is irradiated with tungsten to initiate the reaction between the mixtures.
(4) Take out the reacted material after cooling, separate titanium carbide from tungsten disilicide, and crush them to obtain titanium carbide and tungsten disilicide powders.